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描述:Hiden’s XBS system provides in-situ monitoring of multiple sources with real-time signal output for precise control of the deposition.
XBS三級濾過四極質(zhì)譜(MBE Deposition Rate Monitoring / Control System),適于精確的MBE分析,其他氣體分析和科學實驗使用。Windows? 界面的MASsoft軟件通過RS232、RS485 或以太網(wǎng)控制。
·離子源控制,用于軟離子化和表觀電勢質(zhì)譜 ·一級過濾處增加射頻,抗污染物能力增強
·靈敏度高,檢測范圍: 100% 至5ppb ·質(zhì)量數(shù)范圍: 0~ 510amu XBS Monitor for the Molecular Beam Epitaxy Process (390 KB) Mass Spectrometers for Thin Films, Plasma and Surface Engineering (1.1 MB) |
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